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Plasma etching
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#	Item
41	News Release Nanoplas Announces Important New 14nm Order and Joint Development Agreement with CEA-Leti High-selectivity dry-etch for 14nm OEM pilot line will replace wet etch; CEA-Leti to qualify the system for addition Add to Reading List Source URL: www-leti.cea.fr Language: English - Date: 2013-11-27 09:43:38 Technology Etching Plasma processing Microelectromechanical systems Transducers Dry etching Isotropic etching Plasma etching Wafer Semiconductor device fabrication Microtechnology Materials science
42	Computer Chips new:Environment[removed] Add to Reading List Source URL: www.plasmacoalition.org Language: English - Date: 2006-08-29 00:35:20 Microtechnology Plasma processing Etching Plasma Microfabrication Wafer Isotropic etching Thin film Integrated circuit Semiconductor device fabrication Materials science Technology
43	Marvell NanoLab Member login Lab Manual Contents Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2012-11-20 13:15:45 Microtechnology Microelectromechanical systems Wafer Chemical vapor deposition Deep reactive-ion etching Stepper Reactive-ion etching Plasma etcher Sputtering Semiconductor device fabrication Materials science Technology
44	Marvell NanoLab Member login Lab Manual Contents Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2014-08-28 15:42:25 Technology Spin coating Etching Plasma ashing Photoresist Wafer Resist Microelectromechanical systems Photolithography Semiconductor device fabrication Materials science Microtechnology
45	Chapter[removed]VLSI Etchants Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2011-08-05 15:10:22 Technology Etching Plasma processing Microelectromechanical systems Tetramethylammonium hydroxide Buffered oxide etch Plasma etcher Plasma etching Photoresist Materials science Semiconductor device fabrication Microtechnology
46	Analytical Techniques for Trace Elemental Analyses on Wafer Surfaces for Monitoring and Controlling Contamination J. Wang, M. K. Balazs Balazs Analytical Laboratory, Sunnyvale, CA[removed]P. Pianetta, K. Baur and S. Brenna Add to Reading List Source URL: www-project.slac.stanford.edu Language: English - Date: 2003-04-14 02:31:05 Materials science Microtechnology Vapour phase decomposition Wafer X-ray fluorescence Photolithography Thermal oxidation Inductively coupled plasma mass spectrometry Deep reactive-ion etching Semiconductor device fabrication Chemistry Science
47	PVA TePla 300 Microwave Plasma System Users Manual Coral name: Model: Add to Reading List Source URL: www.nist.gov Language: English - Date: 2013-01-18 08:44:44 Semiconductor device fabrication Chalcogens Nonmetals Oxygen Dry etching Gas Chemistry Matter Periodic table
48	Unaxis 790 Series RIE Metal Fluorine Plasma Processing System Users Manual Coral name: Model: Add to Reading List Source URL: www.nist.gov Language: English - Date: 2013-01-18 08:44:58 Pump Double-click GUI widget Elevator Plasma etching System software Software Technology Semiconductor device fabrication Plasma processing Reactive-ion etching
49	Surface Cleaning and Wet Processing Terminology Contributions by Motorola Corporation Add to Reading List Source URL: www.erc.arizona.edu Language: English - Date: 1999-12-02 13:39:32 Chemistry Etching RCA clean Buffered oxide etch Wafer Piranha solution Photoresist Plasma etching Chemical vapor deposition Semiconductor device fabrication Materials science Microtechnology
50	Microsoft Word - NXR-1020 Data Sheet.doc Add to Reading List Source URL: www.nanotech.ucsb.edu Language: English - Date: 2013-01-06 22:10:49 Semiconductor device fabrication Visual arts Resist Lithography Plasma Isotropic etching Nanoimprint lithography Technology Materials science